EE/MatE 167: Microelectronic Manufacturing Methods

 

David W. Parent

Assistant Professor

Office Hours: MW 10:30-11:30

EE Department SJSU

PH: 408.924.3963

EM: dparent@email.sjsu.edu

HP: http://www.engr.sjsu.edu/dparent

 

Course Description:

CMOS manufacturing methods; advanced processing for integrated circuits. Analysis of yield, statistical process control and design of experiments as applied to process design, integration and characterization.

 

This is a team-oriented, interdisciplinary course enrolling EE, MatE, ChE, ME, Chemistry and Physics majors.  Each student brings a different background to the course.  The laboratory is the central theme of the course. This course will require a considerable amount of work outside of regularly scheduled class time so be prepared to invest a lot of time.

 

Green Sheet/ Syllabus

 

Pixel Level Intensity  to Digital Converter

 

AMI06 transistor data

 

AMI06 ALC

 

2 Mask Sentaurus Work Bench File

 

 

Table 1:  Lecture Topics

#

Date

Topic

Read

Items Due

 

1

1/24/2007

Device Physics Review

Notes

 

 

2

1/29/2007

ALC Design Flow

Notes

HW 1 Solution

Review, Diagnostic

3

1/31/2007

Design of  CMOS Analog Circuits 1

Notes

 

 

4

2/5/2007

Design of  CMOS Analog Circuits 2

Notes

HW 2

 

HW2 Solution

Design Current Mirror

5

2/7/2007

SPC 1

6.1/6.2 Notes

 

 

6

2/12/2007

Tape Out Projects

NA

HW 3

6.1 , 6.6

7

2/14/2007

SPC 2

6.3      Notes

 

Excel File with data for example

 

 

8

2/19/2007

SPC 3

6.4    Notes     

 

 

9

2/21/2007

Review of Semiconductor Manufacturing

1

Notes

HW 4

 

Solution

 

Excel File for HW 4

Sample Control Charts

10

2/26/2007

Oxidation

2.1  Notes

HW 5

# 1.1, 1.2, 1.3

11

2/28/2007

Photolithography

2.2 Notes

 

 

12

3/5/2007

Etching

2.3 Notes

HW 6

#2.1, 2.2 2.3

13

3/7/2007

Doping

2.4 Notes

 

 

14

3/12/2007

Transistor Process Design 

Notes

HW 7

#2.4, 2.6, 2.7

15

3/14/2007

Project Design Reviews

 

 

 

16

3/19/2007

Yield 1

5.1/5.2

 

 

17

3/21/2007

Yield 2

5.3/5.4

 

 

18

3/26/2007

Spring Break

 

 

 

19

3/28/2007

Spring Break

 

 

 

20

4/2/2007

MOS Verification

Notes

HW 8

#5.1, 5.2, 5.3

21

4/4/2007

Continue two mask fabrication project

 

 

 

22

4/9/2007

Reliability 1

Notes

 

 

23

4/11/2007

Continue two mask fabrication project

 

 

 

24

4/16/2007

Reliability 2

Notes

 

 

25

4/18/2007

Continue Testing

Testing Manual

 

 

26

4/23/2007

Statistical Experimental Design 1

7.1

 

 

27

4/25/2007

Continue Testing

Testing Manual

 

 

28

4/30/2007

Statistical Experimental Design 2

7.2

 

 

29

5/2/2007

Statistical Experimental Design 3

7.3

HW 9

#7.1, 7,2

30

5/7/2007

CMOS Review

Notes

 

 

31

5/9/2007

Continue Testing

Testing Manual

 

 

32

5/14/2007

SPC Review

Notes

 

 

33

5/22/2007

Final Exam 14:45-1700

 

 

 

 

 

Table 2 Lab Activities

#

Date

Topic

Item Due

1

1/24/2007

ALC/Unix Tutorial

 

2

1/31/2007

Pick Projects, specification, start project

 

3

2/7/2007

Design Review

Verification Document

4

2/14/2007

Lab tour, Safety, Learn how to Read Veniers

 

5

2/21/2007

SPC overlay project (Take Data)

 

6

2/28/2007

Introduction to Sentaurus Workbench (Tutorial.)

SPC Venier Report

7

3/7/2007

Start Design of 2-mask process

 

8

3/14/2007

Finish Design of 2-mask process

Oral Report/Traveler

9

3/21/2007

Begin two mask fabrication project

 

10

3/28/2007

Spring Break

 

11

4/4/2007

Continue two mask fabrication project

 

12

4/11/2007

Continue two mask fabrication project

 

13

4/18/2007

Testing two mask project 

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