This research seeked to predict the growth of thin films under an applied electric field using a computer model written in LabVIEW in a Windows environment. The experimental portion was carried out at the Microfabrication Laboratory at the University of California at Berkeley, California on an Edwards Auto 306 DC sputtering system, using argon atmosphere with voltage applied to the substrate. The thin film growth rate and sheet resistance were measured. The influences of applied substrate voltage on growth rate and sheet resistance were examined using the computer model.