Processes

Listed below are some of the more common processes used throughout the lab.  Future links will lead to documents that describes best practices, which are presently available in laboratory classes, or from faculty and staff directly.

Photolithography & Spin Processing

• Automated Resist Coating

• Automated Resist Developing

• Alignment & Exposure

• Manual Resist Coating

• Manual Resist Developing

• Spin-On Dopant

Plasma Etching

• Oxide Dry Etching

• Photoresist Ashing

Wet Processing

• Pre-Diffusion Clean

• Photoresist Strip

• Oxide Wet Etching

• Aluminum Etch

• Silicon Anisotropic Etch (TMAH)

Vapor Deposition

• DC Sputtering

• Metal Evaporation

Thermal Processing

• Dry Oxidation

• Wet Oxidation

• Diffusion

• Annealing

Some links lead to PDF files which require Adobe Acrobat Reader.

SJSU  Microscale Process Engineering Laboratory  http://www.engr.sjsu.edu/mpel/

Last Modified 8/23/2008 by SJL